Nanoimprint system GYN-300-1RP_Nanoimprint system_Suzhou Guyi micro Nano Technology Co., LTD

Nanoimprint system

Nano imprint collage system

UVLED curing lamp

Automatic nanoimprint system

Nanoimprint system GYN-300-1RP

The GYN-300-1RP nanoimprint system is a new generation of high performance micro/nano structure transfer equipment based on precision nanoimprint technology and automatic control technology. It is designed for the nano structure of the substrate to the soft film and the soft film to the substrate. It has a high degree of structural reduction and easy to operate man-machine interface. The working environment in the equipment can be purified at 100 levels, and the vacuum impression module and the robot take-up and placement module can be expanded.

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Technical Parameter

Process parameter
Substrate size	4 "-12"	Platform temperature	Room temperature -100℃
Substrate thickness	20mm Max	Platform temperature error	±0.5℃
Substrate material	Silicon, quartz	Substrate fixation method	Vacuum adsorption
Stamping accuracy	Less than 20nm
Residual thickness	Less than 10nm	Solidified area	300x300mm
Residual glue uniformity	±5%（12"）	Curing method	LEDUV365
Depth-to-width ratio	Up to 10:1	UV cooling system	water-cooling
Embossing mode	Line pressure/surface pressure	UV intensity	2W/CM2从10%-100%
Stamping speed	0.01-50mm/ SEC	Operating interface	15 "touch screen
Stripping rate	0.01-50mm/SEC	Storable process	100 groups
Substrate loading	Automatic/semi-automatic/manual	Internal environment	Level 100
Power source	380V 50/60Hz 3PH	Air source	DIA 8 0.6-0.8MPa
Mechanical dimension	1600X1600X2300	weight	1000KG