Nano-imprint collage system GN-300-P_Nano imprint collage system_Suzhou Guyi micro Nano Technology Co., LTD

Nanoimprint system

Nano imprint collage system

UVLED curing lamp

Automatic nanoimprint system

Nano-imprint collage system GN-300-P

The nano-imprint assembly system adopts step-by-step and repeated imprint method, which can splice and imprint the small-size complex structure with the maximum size of 50x50mm onto the large-size (300x300mm) substrate. High structural reduction and precise positioning, as well as consistent pressure control over the entire impression range, make the system excellent for large master and large substencil fabrication applications.

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Technical Parameter

Process parameter
Maximum working size	12 inches	Composition mode	Mold against soft film
Maximum die size	50X50mm	Temperature error	±0.5℃
Mold material	quartz	Mold fixing method	Vacuum adsorption
Composition accuracy	1um	Curing method	LEDUV/Hot plate
Operating interface	15 "touch screen	Solidified area	60x60mm
Substrate loading	Manual operation	Internal environment	Level 100
Power source	220V 50/60Hz	Air source	DIA 8 0.6-0.8MPa
Mechanical dimension	2000X2000X2300	weight	1000KG

Nationwide customer service hotline

0512-68099093

Contact Information

Building 3, No. 85 Zijin Road, High tech Zone, Suzhou City, Jiangsu Province

Fax: 0512-68099076

Email: sales@nanosz.com

Website: www.nanosz.com

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